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558 积分 2024-06-25 加入
Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions
4天前
求助中
Diode-pumped Tm:YLF MOPA system delivering 713 mJ pulse energy with near-diffraction-limited beam quality
10天前
已完结
Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions
10天前
已关闭
Cryogenic plasma etching for SiO2/SiN dielectric films: a mini review
10天前
已完结
Calculated ionization potentials for multiply charged ions
12天前
已完结
Steady-state radiative cooling rates for low-density, high-temperature plasmas
12天前
已完结
An Integrated Multimethod Simulation Framework for Tin Debris Control in Extreme Ultraviolet Lithography
18天前
已关闭
Focusing electrode effect on the EUV lighting technology based on C-beam irradiation technique
24天前
已关闭
Laser-excited Xe plasma as a radiation source for lithography at wavelengths near 11 nm
24天前
已关闭
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
24天前
已关闭
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