Lv4
468 积分 2024-06-25 加入
Diode-pumped Tm:YLF MOPA system delivering 713 mJ pulse energy with near-diffraction-limited beam quality
16小时前
求助中
Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions
18小时前
求助中
Cryogenic plasma etching for SiO2/SiN dielectric films: a mini review
21小时前
已完结
Calculated ionization potentials for multiply charged ions
2天前
已完结
Steady-state radiative cooling rates for low-density, high-temperature plasmas
2天前
已完结
An Integrated Multimethod Simulation Framework for Tin Debris Control in Extreme Ultraviolet Lithography
8天前
已关闭
Focusing electrode effect on the EUV lighting technology based on C-beam irradiation technique
14天前
已关闭
Laser-excited Xe plasma as a radiation source for lithography at wavelengths near 11 nm
14天前
已关闭
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
14天前
已关闭
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
30天前
已关闭
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