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1068 积分 2024-06-25 加入
Detection of silicon-containing etch products during SiN x etching in a hydrogen fluoride plasma using quadrupole mass spectrometry
7天前
已完结
Effects of H2 addition on highly selective SiOCN etching using NF3-based plasma
7天前
已关闭
First fast-ion D-alpha (FIDA) measurements and simulations on C-2U
17天前
已完结
High brilliance, metrology x-ray sources for the soft and tender x-ray range
2个月前
已完结
Driver wavelength and intensity dependence of extreme ultraviolet emission from laser-produced tin microdroplet plasmas
3个月前
已完结
Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency
3个月前
已完结
Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
3个月前
已完结
Physical properties of the HCT EUV source
3个月前
已完结
Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography
3个月前
已完结
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