Lv3
308 积分 2021-12-23 加入
Surface reactions in the chemical vapor deposition of tungsten using WF6 and SiH4 on Al, PtSi, and TiN
3小时前
已完结
Gas-phase reactions of WF6 with SiH4 for deposition of WSin films free from powder formation
3小时前
已完结
Improvement of Adhesion Performances of CVD-W Films Deposited on B[sub 2]H[sub 6]-Based ALD-W Nucleation Layer
4小时前
已完结
Pulsed CVD-W Nucleation Layer Using WF6 and B2H6 for Low Resistivity W
4小时前
已完结
The adhesion of low pressure chemically vapour deposited tungsten films on silicon and SiO2 for SiH4H2WF6 and H2WF6 processes
4小时前
已完结
Gas/surface reactions in the chemical vapor deposition of tungsten using WF6/SiH4 mixtures
4小时前
已完结
Controlled nanostructuration of polycrystalline tungsten thin films
6个月前
已完结
The anisotropic size effect of the electrical resistivity of metal thin films: Tungsten
6个月前
已完结
Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films
1年前
已完结
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