Lv3
400 积分 2025-04-15 加入
Surface Accumulation Induced Negative Schottky Barrier and Ultralow Contact Resistance in Atomic-Layer-Deposited In2O3 Thin-Film Transistors
6天前
已完结
Superior High-Temperature Electrical Characteristics of ALD Ultrathin In2O3 Transistors
6天前
已完结
Kinetic acceleration of MoS 2 growth by oxy-metal-organic chemical vapor deposition
8天前
已完结
Radiation-tolerant atomic-layer-scale RF system for spaceborne communication
8天前
已完结
Atomic layer deposition of Ru using a new zero-valent Ru precursor with a ligand system combining open and closed ligands
11天前
已关闭
Cryogenic‐Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra‐High Selectivity of Atomic Layer Etching Between SiO 2 and SiN
11天前
已完结
Ferroelectric transistors for low-power NAND flash memory
12天前
已完结
BEOL Interconnect Innovation: Materials, Process and Systems Co-optimization for 3nm Node and Beyond
12天前
已完结
BEOL Interconnects for 2nm Technology Node and Beyond
12天前
已完结
Deposition of ALD-Molybdenum for Flash Memory Wordline Metallization
12天前
已完结
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