Lv3
390 积分 2025-04-15 加入
Atomic Layer Deposition of Ru for Replacing Cu-Interconnects
2天前
已完结
Surface Accumulation Induced Negative Schottky Barrier and Ultralow Contact Resistance in Atomic-Layer-Deposited In2O3 Thin-Film Transistors
14天前
已完结
Superior High-Temperature Electrical Characteristics of ALD Ultrathin In2O3 Transistors
14天前
已完结
Kinetic acceleration of MoS 2 growth by oxy-metal-organic chemical vapor deposition
16天前
已完结
Radiation-tolerant atomic-layer-scale RF system for spaceborne communication
16天前
已完结
Atomic layer deposition of Ru using a new zero-valent Ru precursor with a ligand system combining open and closed ligands
19天前
已关闭
Cryogenic‐Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra‐High Selectivity of Atomic Layer Etching Between SiO 2 and SiN
19天前
已完结
Ferroelectric transistors for low-power NAND flash memory
20天前
已完结
BEOL Interconnect Innovation: Materials, Process and Systems Co-optimization for 3nm Node and Beyond
20天前
已完结
BEOL Interconnects for 2nm Technology Node and Beyond
20天前
已完结
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