Lv11
58 积分 2022-06-09 加入
Dry-etching properties of TiN for metal/high-k gate stack using BCl3-based inductively coupled plasma
54分钟前
求助中
Plasma etching: Yesterday, today, and tomorrow Available to Purchase
57分钟前
求助中
Effect of pre-deposition annealing on the performance of MIS capacitor formed using atomic layer deposition of ultrathin
16天前
已完结
A Reliable Si3N4/Al2O3-HfO2 Stack MIM Capacitor for High-Voltage Analog Applications
19天前
已完结
Novel structure of deep trench capacitor with higher breakdown and higher capacitance density for Low Dropout Voltage regulator
21天前
已完结
Through-substrate via (TSV) with embedded capacitor as an on-chip energy storage element
21天前
已完结
Ultra thin low ESL and ultra wide broadband silicon capacitors
1个月前
已完结
Post-trench processing of silicon deep trench capacitors for power electronic applications
1个月前
已完结
Temperature dependence of TDDB voltage acceleration in high-κ/ SiO2 bilayers and SiO2 gate dielectrics
1个月前
已完结
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