Lv712
4860 积分 2023-10-09 加入
Low-damage etching of poly-Si and SiO2 via a low-energy electron beam in inductively coupled CF4 plasma
2小时前
已完结
Etching characteristics of Pb(Zr,Ti)O3, Pt, SiO2and Si3N4in an inductively coupled HBr/Ar plasma
3小时前
已关闭
Temperature- and flow-controlled dielectric barrier discharge plasma for non-equilibrium CO2 excitation: Application in epoxidation
4小时前
已完结
Deep learning-based pulsed plasma discharge modeling
4小时前
已关闭
Fluid-kinetic modeling of a high power density radio frequency inductively coupled positive hydrogen ion source
4天前
已完结
Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
4天前
已完结
Complex transients in power modulated inductively-coupled chlorine plasmas
4天前
已完结
Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges
4天前
已完结
Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
4天前
已关闭
Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation
4天前
已完结
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