Lv5
1378 积分 2022-07-12 加入
Etch proximity correction for curvilinear layout: curve sampling with ML etch bias model
1个月前
已关闭
You do not need 1 nm contours for curvilinear shapes: pixel-based computing is the answer
1个月前
已完结
Design Rules in a Semiconductor Foundry
9个月前
已完结
TCAD Simulation of Novel Semiconductor Devices
10个月前
已完结
Trends in e-beam metrology and inspection
11个月前
已完结
Novel glitch reduction techniques for ultra-low power digital design
1年前
已完结
Self-Timed Pulsed Latch for Low-Voltage Operation With Reduced Hold Time
1年前
已完结
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