Lv11
40 积分 2024-09-04 加入
Growth of diamond-like carbon films with significant nanocrystalline phases in a low-pressure high-density CH4 plasma in ICP-CVD: Effect of negative dc substrate bias
6小时前
已完结
Large-area bifacial n-TOPCon solar cells with in situ phosphorus-doped LPCVD poly-Si passivating contacts
2个月前
已完结
Structural and Fluorine Plasma Etching Behavior of Sputter-Deposition Yttrium Fluoride Film
4个月前
已完结
Preferential crystal orientation etching of GaN nanopillars in Cl2 plasma
4个月前
已完结
Low-temperature PECVD silicon-nitride passivation for perovskite solar cell
4个月前
已完结
Plasma etching behavior of yttrium‐aluminum oxide composite ceramics
4个月前
已完结
Recent Advances in Plasma Etching for Micro and Nano Fabrications of Silicon-based Materials: A Review
4个月前
已完结
Selective Etching of SiO2 by Radical Recombination through NF3/H2 Pulsed RF Plasma
4个月前
已完结
Simulation of silicon etching in NF3 plasma reactor
4个月前
已完结
Mechanism of highly selective etching of SiCN by using NF3/Ar-based plasma
4个月前
已完结
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