Lv1
56 积分 2026-04-21 加入
Investigation into a prototype extreme ultraviolet low-n attenuated phase-shift mask
3天前
已完结
The Material Selectionof High Numerical ApertureEUV Mask Absorbers Based on Waveguide Effects and Aerial Image Metrics
23天前
已完结
Optical investigation of stacked absorber type black border on EUV mask
26天前
已完结
Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall
1个月前
已完结
Effects of EUV multilayer roughness on 2D patterning
2个月前
已关闭
Multilayer defects: impact on aerial image through focus
2个月前
已完结
Contribution of mask roughness in stochasticity of high-NA EUV imaging
2个月前
已完结
Physical optics study of mask roughness in EUV interference lithography
2个月前
已关闭
Source optimization for anamorphic magnification high-numerical aperture extreme ultraviolet lithography based on thick mask model
3个月前
已完结
Actinic patterned mask inspection for EUV lithography
3个月前
已完结
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