| 标题 |
Physical optics study of mask roughness in EUV interference lithography |
| 网址 | |
| DOI | |
| 其它 |
期刊:Advances in X-Ray/EUV Sources, Optics, and Components XX 作者:Jerome Knappett; Cameron M. Kewish; Blair Haydon; Grant A. van Riessen; Hidekazu Mimura; Ali M. Khounsary 出版日期:2025 |
| 求助人 | |
| 下载 |
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(2025-6-4)