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Plasma-controlled surface wettability: recent advances and future applications
4小时前
待确认
Introduction of pre-etch deposition techniques in EUV patterning
15天前
已完结
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
26天前
已完结
Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscale Si Trench Etch Process
27天前
已完结
Extreme UV self-aligned double patterning process optimization for BEOL interconnections on 3nm nodes and beyond
1个月前
已完结
Investigation of the influence of hardmask morphology on bowing effect in nano-scale silicon plasma etching process
1个月前
已完结
LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL)
1个月前
已完结
Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme
1个月前
已完结
Overview of atomic layer etching in the semiconductor industry
2个月前
已完结
A model for etching of three-dimensional high aspect ratio silicon structures in pulsed inductively coupled plasmas
3个月前
已完结
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