Lv11
62 积分 2024-05-29 加入
Contacts and lines SEM image metrology with SMILE
1小时前
已完结
Overlay control for 7nm technology node and beyond
1个月前
已完结
Wafer heating analysis with pattern variation in EUVL
1个月前
已完结
Novel approach for KrF chemically amplified resist optimization assisted by deep learning
1个月前
已关闭
Multiple distinct plasmas in extreme ultraviolet lithography sources
1个月前
已完结
PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO) (Conference Presentation)
1个月前
已完结
Chemistry-informed machine learning model for EUV photoresist development
1个月前
已完结
Novel approach for KrF chemically amplified resist optimization assisted by deep learning
1个月前
已关闭
Predicting the critical features of the chemically-amplified resist profile based on machine learning
1个月前
已完结
Surrogate-assisted genetic algorithm for efficient resist calibration
2个月前
已完结