Lv1
32 积分 2024-05-29 加入
Experimental approach to EUV imaging enhancement by mask absorber height optimization
1个月前
已完结
Gaussian random field EUV stochastic models, their generalizations and lithographically meaningful stochastic metrics
1个月前
已完结
Stochastic printing behavior of ML-defects on EUV mask
1个月前
已完结
Contacts and lines SEM image metrology with SMILE
1个月前
已完结
Overlay control for 7nm technology node and beyond
3个月前
已完结
Wafer heating analysis with pattern variation in EUVL
3个月前
已完结
Novel approach for KrF chemically amplified resist optimization assisted by deep learning
3个月前
已关闭
Multiple distinct plasmas in extreme ultraviolet lithography sources
3个月前
已完结
PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO) (Conference Presentation)
3个月前
已完结
Chemistry-informed machine learning model for EUV photoresist development
3个月前
已完结