Lv21
200 积分 2025-04-21 加入
Analytical solutions for the deformation of a photoresist film
1小时前
待确认
Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node
1小时前
待确认
Considerations in the design of photoacid generators
7个月前
已完结
Toxicity of ionic liquids: Database and prediction via quantitative structure–activity relationship method
8个月前
已完结
Regulation and Synthesis of Mixed‐Ligand Titanium–Oxide Nanoparticles for 12 nm Nanolithography
8个月前
已完结
Soft bake effect in 193 - nm chemically amplified resist
1年前
已完结
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