| 标题 |
Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node |
| 网址 | |
| DOI |
10.1117/12.534610
doi
|
| 其它 |
期刊:SPIE Advanced Lithography 作者:C. Wallace; Jochen Schacht; I. Huang; Ruei-Hung Hsu 出版日期:2004-05-14 |
| 求助人 | |
| 下载 |
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(2025-6-4)