Lv3
240 积分 2025-06-22 加入
Photolysis of ortho-nitrobenzylic derivatives: the importance of the leaving group
4天前
已完结
A novel merocyanine photoacid for visible light-controlled pH modulation
6天前
已完结
Advanced lithography materials: From fundamentals to applications
13天前
已完结
Bis-acrylate functionalized enone as photoinitiators for UV-LED photopolymerization
20天前
已关闭
Zn-Ti oxo cluster photoresists for EUV Lithography: Cluster structure and lithographic performance
20天前
已完结
Macrocyclic Calixpyridinium as a Photoacid for the Construction of Photoresponsive Supramolecular Materials
26天前
已完结
Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator‐Bound Polymer Resists
26天前
已完结
模糊的边界:高校研究生何以既无研究也无生活
1个月前
已完结
Photocleavable Ligand-Induced Direct Photolithography of InP-Based Quantum Dots
1个月前
已完结
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