Lv4
550 积分 2024-04-28 加入
Compact modeling of negative tone development resist with photo decomposable quencher
1天前
已完结
3D NTD resist deformation compact model for OPC and ILT applications
2天前
待确认
3D NTD resist deformation compact model for OPC and ILT applications
2天前
已完结
Three dimensional mask effects in OPC process model development from first principles simulation
2个月前
已完结
3d mask simulation and lithographic imaging using physics-informed neural networks
2个月前
已完结
Optical proximity correction with the conditional Wasserstein GAN
8个月前
已完结
Fast source mask co-optimization method for high-NA EUV lithography
8个月前
已完结
Advances in DOE modeling and optical performance for SMO applications
8个月前
已完结
Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align
8个月前
已完结
Mask Bias optimization for NTD lithography process
8个月前
已完结
Determination of pharmacokinetics and tissue distribution of a novel lutetium-labeled PSMA-targeted ligand, 177Lu-DOTA-PSMA-GUL, in rats by using LC–MS/MS
镁基CO2吸附剂的合成及其吸脱附性能的研究
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