Lv41
439 积分 2024-04-28 加入
Study of model based etch bias retarget for OPC
5小时前
已完结
Combining lithography and etch models in OPC modeling
5小时前
已完结
Compact modeling of negative tone development resist with photo decomposable quencher
1个月前
已完结
3D NTD resist deformation compact model for OPC and ILT applications
1个月前
已完结
3D NTD resist deformation compact model for OPC and ILT applications
1个月前
已完结
Three dimensional mask effects in OPC process model development from first principles simulation
4个月前
已完结
3d mask simulation and lithographic imaging using physics-informed neural networks
4个月前
已完结
Optical proximity correction with the conditional Wasserstein GAN
10个月前
已完结
Fast source mask co-optimization method for high-NA EUV lithography
10个月前
已完结
Advances in DOE modeling and optical performance for SMO applications
10个月前
已完结
Determination of pharmacokinetics and tissue distribution of a novel lutetium-labeled PSMA-targeted ligand, 177Lu-DOTA-PSMA-GUL, in rats by using LC–MS/MS
镁基CO2吸附剂的合成及其吸脱附性能的研究
皖公网安备34019202002308
