Lv21
166 积分 2023-12-19 加入
EUV OPC for the 20-nm node and beyond
1小时前
待确认
Surrogate-assisted genetic algorithm for efficient resist calibration
1个月前
已完结
OPC model calibration using deep reinforcement learning
1个月前
已完结
Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method
1个月前
已完结
Compensation of long-range process effects on photomasks by design data correction
1个月前
已完结
Model based mask process correction and verification for advanced process nodes
1个月前
已完结
Mask process proximity correction for next-generation mask fabrication
2个月前
已完结
Entering mask process correction era for EUV mask manufacturing
2个月前
已完结
Simultaneous calibration of acid diffusion and developer loading parameters for computational lithography
2个月前
已完结
A simulation of micro-loading phenomena in dry-etching process using a new adsorption model
2个月前
已完结
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