| 标题 |
Mask process proximity correction for next-generation mask fabrication |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:Soon Ho Kim; Sung-Woon Choi; Jung-Min Sohn; Jong Rak Park 出版日期:2003-11-01 |
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(2025-6-4)