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40 积分 2024-06-12 加入
Nanoscale electron beam induced etching: a continuum model that correlates the etch profile to the experimental parameters
4个月前
已完结
Inhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks
5个月前
已完结
Quantification of Fracture Roughness and its Effects on the Grain and Pore Size Distribution of the Fractured Rock Using Image Analysis Technique
6个月前
已完结
Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly
6个月前
已完结
Mo-Si Interface Formation by Ion Beam Sputter Deposition
8个月前
已关闭
Ion beam assisted deposition of multi-layer X-ray mirrors for the extreme ultraviolet lithography
8个月前
已关闭
Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution
8个月前
已完结
UV surface pre-treatment and wet cleaning of Ruthenium MP18 semi-damascene structures
8个月前
已完结
Novel capping layer evaluation for EUV mask
8个月前
已关闭
Process optimization for performance improvement in Mo/Si multilayers for EUV mask blanks
8个月前
已完结
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