| 标题 |
Nanoscale Ruthenium-Containing Deposits from Ru(CO)4I2 via Simultaneous Focused Electron Beam-Induced Deposition and Etching in Ultrahigh Vacuum: Mask Repair in Extreme Ultraviolet Lithography and Beyond 超高真空中通过同时聚焦电子束诱导沉积和蚀刻从Ru(CO)4I2制备纳米级含钌沉积物:极紫外光刻及以后的掩模修复
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期刊: 作者: 出版日期:2022-03-15 |
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(2025-6-4)