Lv3
326 积分 2024-02-25 加入
Fabrication of high-performance ALD-Al2O3/SiO2 nanolaminate coating for atomic oxygen erosion resistance on polyimide
1天前
待确认
Multiscale modeling of area-selective atomic layer deposition of SiO2 on Al2O3 and SiO2 surfaces with intermediate etching steps
8天前
已完结
Nonconventional growth characteristics of tin silicon oxide grown by thermal atomic layer deposition using H2O as oxidant
8天前
已完结
Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)silane and ozone
8天前
已完结
Temperature-dependent impurity control and electronic structure optimization in ALD-deposited Al2O3 films for enhanced functional applications
10天前
已完结
Atomic layer deposition of Y2O3 as high-k dielectrics by using a heteroleptic yttrium precursor and water
10天前
已完结
HfO2:Y2O3 ultrathin nanolaminate structures grown by ALD: Bilayer thickness and annealing temperature effects on optical properties
10天前
已完结
Nucleation and Growth of Atomic Layer Deposition: Effect of Substrate and Precursor Chemistry
10天前
已关闭
Low-Temperature Rough-Surface Wafer Bonding with AlN/AlN Via Oxygen Plasma Activation
11天前
已完结
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