| 标题 |
Degradation behaviors and mechanisms of perfluoroelastomers exposed to a high-temperature chlorine-containing environment for semiconductor dry etching equipment |
| 网址 | |
| DOI | |
| 其它 |
期刊:Polymer Degradation and Stability 作者:Fandi Meng; Xiaolong Wen; Shucheng Ren; Peng Sun; Tao Zhang; et al 出版日期:2026-10-01 |
| 求助人 | |
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(2025-6-4)