| 标题 |
Reactive ion beam etching of ferroelectric materials using an RF inductively coupled ion beam source |
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| DOI | |
| 其它 |
期刊:ISAF '96. Proceedings of the Tenth IEEE International Symposium on Applications of Ferroelectrics 作者:K. Williams; A. Hayes; S. DiStefano; O. Huang; E. Ostan 出版日期:2002-12-24 |
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(2025-6-4)