| 标题 |
Improving EUV Patterning Fidelity and Aberration Control through Source-Mask Co-Optimization |
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| DOI | |
| 其它 |
期刊:2025 IEEE 16th International Conference on ASIC (ASICON) 作者:Qi Wang; Qiang Wu; Ying Li; Xianhe Liu; Yanli Li 出版日期:2026-01-20 |
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(2025-6-4)