| 标题 |
Numerical Simulation of Polycrystalline Silicon Thin-Film Deposition via an Anisotropic Porous Medium Model in an LPCVD Tubular Reactor |
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| DOI | |
| 其它 |
期刊:Industrial & Engineering Chemistry Research 作者:Weilong Lei; Chuangen Xu; Jixinyu Yao; T Liu; H Chen; et al 出版日期:2026-07-08 |
| 求助人 | |
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(2025-6-4)