| 标题 |
Carrier gas flow rate effects on additive-assisted low-temperature Y2O3 film deposition by atmospheric pressure plasma jet |
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| DOI | |
| 其它 |
期刊:Materials Science in Semiconductor Processing 作者:Bat-Orgil Erdenezaya; Md. Shahiduzzaman; Hirochika Uratani; Ruka Yazawa; Yusuke Nakano; et al 出版日期:2025-02-12 |
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(2025-6-4)