| 标题 |
Stochastic simulation of the UV curing process in nanoimprint lithography: Pattern size and shape effects in sub-50 nm lithography |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:M. Koyama; M. Shirai; H. Kawata; Y. Hirai; M. Yasuda 出版日期:2017-11-22 |
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(2025-6-4)