| 标题 |
Good stress or bad stress? A dual-pathway model of how AI-induced technostress shapes employee resilience |
| 网址 | |
| DOI | |
| 其它 |
期刊:Service Industries Journal 作者:Jian Zhou; Hong Yun Wang; Ya Wei Lu; Y Zhang 出版日期:2026-06-06 |
| 求助人 | |
| 下载 |
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(2025-6-4)