| 标题 |
Environment-friendly chemical mechanical polishing using NaHCO3-activated H2O2 slurry for highly efficient finishing of 4H-SiC (0001) surface |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Manufacturing Processes 作者:Yu Shen; Haoxiang Wang; Xiaoguang Guo; Shang Gao 出版日期:2023-12-16 |
| 求助人 | |
| 下载 |
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(2025-6-4)