| 标题 |
Reduced material loss caused by Electron Beam Lithography in thin-film lithium niobate through post-process annealing |
| 网址 | |
| DOI | |
| 其它 |
期刊:Optical Materials 作者:Jiakang Shi; Zhilin Ye; Mengcheng Lv; Daohan Ge; Liqiang Zhang; et al 出版日期:2024-02-08 |
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(2025-6-4)