| 标题 |
The new technology of molecular and gene introduction method using discharge plasma: plasma brings features of random genome integration-free and damage-free to cells, genomic-DNA and external introducing molecules |
| 网址 | |
| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Masafumi Jinno; Susumu Satoh; Yoshihisa Ikeda; Hideki Motomura 出版日期:2021-02-13 |
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(2025-6-4)