| 标题 |
Lithography hotspot correction on post-OPC layout using generative adversarial networks |
| 网址 | |
| DOI |
10.1117/1.jmm.25.3.031603
doi
|
| 其它 |
期刊:Journal of Micro/Nanopatterning, Materials, and Metrology 作者:Weilun Chiu; Fu-Tse Cheng; Tony Hu; Yi-Yen Tsai; Chung-Te Hsuan; et al 出版日期:2026-04-03 |
| 求助人 | |
| 下载 | 暂无链接,等待应助者上传 |
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(2025-6-4)