| 标题 |
Overcoming the thickness scaling limit in hafnium-based ferroelectrics via interfacial strain and conductivity engineering |
| 网址 | |
| DOI |
10.26599/nr.2026.94908815
doi
|
| 其它 |
期刊:Nano Reseach 作者:Bohan Xu; F. Wunderwald; Kristina M. Holsgrove; Athira Sunil; R. Guido; et al 出版日期:2026-05-01 |
| 求助人 | |
| 下载 |
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(2025-6-4)