| 标题 |
Thickness scaling of ferroelectric switching and domain-wall activation field in epitaxial Hf0.5Zr0.5O2 thin films |
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| DOI | |
| 其它 |
期刊:Journal of Alloys and Compounds 作者:Yoonho Ahn; Jong Yeog Son 出版日期:2026-11-01 |
| 求助人 | |
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(2025-6-4)