| 标题 |
Low-k dielectric etch challenges at the 7 nm logic node and beyond: Continuous-wave versus quasiatomic layer plasma etching performance review |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science and Technology 作者:Katie Lutker-Lee; Yen-Tien Lu; Qiaowei Lou; J. Kaminsky; Y. Kikuchi; et al 出版日期:2019-01-01 |
| 求助人 | |
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(2025-6-4)