| 标题 |
 Model assisted process development to enable faster 3D-NAND memory hole profile deposition and etch co-optimization |
| 网址 | |
| DOI |
10.1117/12.3090173
doi
|
| 其它 |
期刊：Advanced Etch Technology and Process Integration for Nanopatterning XV 作者：Hao-Di Chi; C. Phan; Matt Adams; Sloan Roberts; John Hoang 出版日期：2026-04-09 |
| 求助人 | |
| 下载 | 暂无链接，等待应助者上传 |
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(2025-6-4)
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