| 标题 |
Reduction of threading dislocation density in SiGe epilayer on Si (0 0 1) by lateral growth liquid-phase epitaxy |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Crystal Growth 作者:Andrew J. O'Reilly; Nathaniel J. Quitoriano 出版日期:2018 |
| 求助人 | |
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(2025-6-4)