| 标题 |
Nano-scale residual stress depth profiling in Cu/W nano-multilayers as a function of magnetron sputtering pressure |
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| DOI | |
| 其它 |
期刊:Surface & Coatings Technology 作者:L. Romano-Brandt; E. Salvati; E. Le Bourhis; T. Moxham; I. Dolbnya; et al 出版日期:2020-01-01 |
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(2025-6-4)