| 标题 |
Unraveling crosslinking effects in EUV metal oxide photoresist performance via large-scale atomistic simulations |
| 网址 | |
| DOI | |
| 其它 |
期刊:Advances in Patterning Materials and Processes XLIII 作者:Ching-Yu Huang; Gyeong Hwang; Peter Ventzek; Shyam Sridhar; Zhiying Chen; et al 出版日期:2026-04-10 |
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(2025-6-4)