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4970 积分 2022-04-10 加入
Halogen and Halomethyl Substitution Effects in Anthracene-Based Extreme Ultraviolet Resist Models: A Theoretical Study of Dissociation Mechanisms and Optoelectronic Properties
3小时前
待确认
Atomistic insights into EUV photoresist photolysis via full temporal dynamics
7天前
已完结
Chemical origins of environmental modifications to the lithographic chemistry of metal oxide resists
28天前
已关闭
N-heterocycles for inducing high-sensitivity to inorganic resist compositions
28天前
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Novel EUV photoresists for positive tone development
28天前
已关闭
Fundamental mechanisms during EUV exposure and crosslinking of model organometallic photoresists
28天前
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Vapor-phase dry development enabling high-resolution and improved CDU in EUV photoresists
28天前
已关闭
Ab-initio investigation of fundamental reaction mechanisms, environmental effects and EUV reactivity of Sn-based metal oxide photoresists
28天前
已关闭
Development methods for metal oxide photoresists: a fundamental investigation using lithography simulations
28天前
已关闭
Effect of molecular layer deposition parameters on the electron beam resist properties of hafnicone hybrid films
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