Lv7
5000 积分 2022-04-10 加入
Metal-oxide resist height variations through pitch in EUV lithography
8小时前
已完结
Measurements of net electron and reaction range in PMMA: an organometallic resists, and a chemically amplified resist for EUV lithography
1个月前
已完结
Mechanistic study of infiltration synthesis of organic-inorganic hybrid resists for EBL and EUVL resist
1个月前
已关闭
Physics-based dry metal–oxide–resist simulations
1个月前
已完结
Kinetics of the free-radical copolymerization of methyl methacrylate/ethylene glycol dimethacrylate: 2. Analysis of gelation and the pregel region
3个月前
已完结
Azide-Functionalized Organotin Carboxylate Lithography Resist
4个月前
已完结
Dielectric Modulation of Ionization Energetics in Organotin Extreme Ultraviolet Photoresists
4个月前
已完结
Interface formation and optical design of EUV reflective multilayer mirrors
5个月前
已完结
Spin-on Deposition of Amorphous Zeolitic imidazolate Framework (aZIF) Films for Lithography Applications
5个月前
已完结
Halogen and Halomethyl Substitution Effects in Anthracene-Based Extreme Ultraviolet Resist Models: A Theoretical Study of Dissociation Mechanisms and Optoelectronic Properties
5个月前
已完结
Effect of molecular layer deposition parameters on the electron beam resist properties of hafnicone hybrid films
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