Lv7
5000 积分 2022-04-10 加入
Kinetics of the free-radical copolymerization of methyl methacrylate/ethylene glycol dimethacrylate: 2. Analysis of gelation and the pregel region
1个月前
已完结
Azide-Functionalized Organotin Carboxylate Lithography Resist
2个月前
已完结
Dielectric Modulation of Ionization Energetics in Organotin Extreme Ultraviolet Photoresists
2个月前
已完结
Interface formation and optical design of EUV reflective multilayer mirrors
3个月前
已完结
Spin-on Deposition of Amorphous Zeolitic imidazolate Framework (aZIF) Films for Lithography Applications
3个月前
已完结
Halogen and Halomethyl Substitution Effects in Anthracene-Based Extreme Ultraviolet Resist Models: A Theoretical Study of Dissociation Mechanisms and Optoelectronic Properties
3个月前
已完结
Atomistic insights into EUV photoresist photolysis via full temporal dynamics
4个月前
已完结
Chemical origins of environmental modifications to the lithographic chemistry of metal oxide resists
4个月前
已关闭
N-heterocycles for inducing high-sensitivity to inorganic resist compositions
4个月前
已关闭
Effect of molecular layer deposition parameters on the electron beam resist properties of hafnicone hybrid films
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