| 标题 |
 Molecular design of a positive tone organometal chemically amplified resist for small size contact hall by high-NA EUV lithography |
| 网址 | |
| DOI |
10.1117/12.3071799
doi
|
| 其它 |
期刊：International Conference on Extreme Ultraviolet Lithography 2025 作者：Satoshi Enomoto; Kohei Machida; Shyunya Honda; Amit Jaiswal; Akihiro Konda; et al 出版日期：2025-11-06 |
| 求助人 | |
| 下载 | 暂无链接，等待应助者上传 |
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(2025-6-4)
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