| 标题 |
Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure |
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| DOI | |
| 其它 |
期刊:SPIE Proceedings 作者:Seiji Nagahara; Michael Carcasi; Hisashi Nakagawa; Elizabeth Buitrago; Oktay Yildirim; et al 出版日期:2016-03-23 |
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(2025-6-4)