| 标题 |
Characteristics of germanium tetrabromide (GeBr4) as a precursor for low-temperature selective epitaxial growth of Si1-xGex |
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| DOI | |
| 其它 |
期刊:Chemical Engineering Journal 作者:Hyerin Shin; Seokmin Oh; D. Yoon; Seonwoong Jung; JungWoo Kim; et al 出版日期:2026-08-01 |
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(2025-6-4)