| 标题 |
Plasma etching behavior and microstructural characteristics of single-phase (Ti, Zr, Hf, Nb, Ta)C under different CF4/O2/Ar gas compositions |
| 网址 | |
| DOI | |
| 其它 |
期刊:Ceramics International 作者:Changhae Oh; Sujin Woo; Nayoung Ham; Kangduk Kim 出版日期:2026-07-01 |
| 求助人 | |
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(2025-6-4)