| 标题 |
Thermal annealing effects on the structural and electrical properties of HfO2/Al2O3 gate dielectric stacks grown by atomic layer deposition on Si substrates |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Applied Physics 作者:Moonju Cho; Hong Bae Park; Jaehoo Park; Cheol Seong Hwang; Jong-Cheol Lee; et al 出版日期:2003-08-01 |
| 求助人 | |
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(2025-6-4)