| 标题 |
Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science & technology 作者:Andreas Fischer; David S. L. Mui; Aaron Routzahn; Ryan J. Gasvoda; Jim Sims; et al 出版日期:2022-12-28 |
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(2025-6-4)