| 标题 |
Investigation of ALD-deposited Nb2O5/HfO2 stacks on III-V (GaAs) substrate for metal-oxide-semiconductor (MOS) device applications |
| 网址 | |
| DOI |
10.1117/12.3059474
doi
|
| 其它 |
期刊:Oxide-based Materials and Devices XVI 作者:ajay Kumar; Prabhat Prajapati; Rajib Saha; Saurabh Lodha; Subhananda Chakrabarti 出版日期:2025-03-19 |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时,文件已从服务器自动删除,无法下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)