| 标题 |
The Effect of Si/SiO2 Interface on the Electrical Properties of MOS Device with Nano Layer Silicon Dioxide Grown by Induced Laser Oxidation |
| 网址 | |
| DOI |
10.33899/rjs.2017.139276
doi
|
| 其它 |
期刊:Rafidain Journal of Science 作者:Mohand M. Alyass; Laith M. Al- Taan 出版日期:2017-12-01 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)