| 标题 |
The Modelization of the Wet Etching Rate by the Segregation Boron and Phosphorus Distributions in Si/SiO<sub>2</sub> |
| 网址 | |
| DOI | |
| 其它 |
期刊:OALib 作者:Badra Bouabdallah; Yamina Bourezig; Zakia Nabi; Saliha Kheris; Boucif Benichou; Omar Benhelal 出版日期:2014-06-19 |
| 求助人 | |
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(2025-6-4)