| 标题 |
Wet etch clean-up of plasma damage for 1.68 kV breakdown in NiO/β-Ga2O3 chlorine-etched PN diodes |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science & technology 作者:Audrey Rose Gutierrez; Joseph Spencer; Alan G. Jacobs; Yuan Qin; Jenifer R. Hajzus; et al 出版日期:2025-05-01 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)