| 标题 |
Optimizing dual-function underlayers for minimal defectivity of directed self-assembly rectified extreme ultraviolet lithography patterns |
| 网址 | |
| DOI |
10.1117/1.jmm.24.3.033001
doi
|
| 其它 |
期刊:Journal of Micro/Nanopatterning, Materials, and Metrology 作者:Byeong-U Bak; Lander Verstraete; Roberto Fallica; Yuki Fukumura; Takehiro Seshimo; et al 出版日期:2025-07-03 |
| 求助人 | |
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(2025-6-4)